Invention Grant
- Patent Title: Electron beam irradiating apparatus with monitoring device
- Patent Title (中): 具有监测装置的电子束照射装置
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Application No.: US12992036Application Date: 2009-05-01
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Publication No.: US08227776B2Publication Date: 2012-07-24
- Inventor: Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
- Applicant: Tomoyuki Hikosaka , Shiro Eguchi , Takayuki Suzuki , Nobuyasu Harada , Satoru Gohzaki , Shigekatsu Sato , Isao Hashimoto
- Applicant Address: JP Tokyo
- Assignee: Japan AE Power System Corporation
- Current Assignee: Japan AE Power System Corporation
- Current Assignee Address: JP Tokyo
- Agency: Brundidge & Stanger, P.C.
- Priority: JP2008-124495 20080512
- International Application: PCT/JP2009/058877 WO 20090501
- International Announcement: WO2009/139399 WO 20091119
- Main IPC: G21K5/04
- IPC: G21K5/04

Abstract:
The electron beam irradiating apparatus with the monitoring device has an electron beam irradiating means for irradiating materials in an irradiation chamber. The monitoring device has a photographing means for imaging a lights emitted by irradiating an electron beam to the materials; a storage means that stores state of electron beam irradiation in advance; and a calculating means that processes an image, which is captured by the photographing means, to decide a state of electron beam irradiation. The storage means has stored at least three state of electron beam irradiation and also has stored image luminance associated with those states of electron beam irradiation. The calculating means loads the image, which is captured by the photographing means, to compare the loaded image with the image luminance stored in the storage means, thereby deciding a state of electron beam irradiation.
Public/Granted literature
- US20110062351A1 ELECTRON BEAM IRRADIATING APPARATUS WITH MONITORING DEVICE Public/Granted day:2011-03-17
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