Invention Grant
- Patent Title: Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same
- Patent Title (中): 接近底物制备顺序及其实施方法，装置和系统
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Application No.: US10882716Application Date: 2004-06-30
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Publication No.: US08236382B2Publication Date: 2012-08-07
- Inventor: Michael Ravkin , John M. de Larios , Mikhail Korolik , Michael G. R. Smith , Carl Woods
- Applicant: Michael Ravkin , John M. de Larios , Mikhail Korolik , Michael G. R. Smith , Carl Woods
- Applicant Address: US CA Fremont
- Assignee: Lam Research Corporation
- Current Assignee: Lam Research Corporation
- Current Assignee Address: US CA Fremont
- Agency: Martine Penilla Group, LLP
- Main IPC: B05D3/00
- IPC: B05D3/00 ; B05D3/10
Abstract:
A method for preparing a surface of a substrate is provided. The method includes scanning the surface of the substrate by a meniscus, preparing the surface of the substrate using the meniscus, and performing a next preparation operation on the surface of the substrate that was prepared without performing a rinsing operation.
Public/Granted literature
- US20050158473A1 Proximity substrate preparation sequence, and method, apparatus, and system for implementing the same Public/Granted day:2005-07-21
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