Invention Grant
- Patent Title: Electroplating apparatus
- Patent Title (中): 电镀设备
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Application No.: US12913782Application Date: 2010-10-28
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Publication No.: US08252154B2Publication Date: 2012-08-28
- Inventor: Chien-Pang Cheng
- Applicant: Chien-Pang Cheng
- Applicant Address: TW Tayuan, Taoyuan
- Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee: Zhen Ding Technology Co., Ltd.
- Current Assignee Address: TW Tayuan, Taoyuan
- Agency: Altis Law Group, Inc.
- Priority: CN201020143752 20100329
- Main IPC: C25D17/06
- IPC: C25D17/06 ; C25D17/08

Abstract:
An electroplating apparatus includes an electroplating tank, a first supporting bar, a first holding element, two second supporting bars, a number of spaced crossbars, a number of second holding elements, and a power supply. The first holding element is suspended in the tank from the first supporting bar, and the first holding element is configured for holding a plate-shaped workpiece in a manner that the workpiece is oriented along the first supporting bar. The second holding elements are suspended from the corresponding crossbars, each of the second holding elements arranged between the first and one of the second supporting bars and configured for holding a metal block. The power supply includes a cathode for electrical connection to the workpiece through the first supporting bar and the first holding element and an anode for electrically connection to the metal blocks through the second supporting bars and the second holding elements.
Public/Granted literature
- US20110233052A1 ELECTROPLATING APPARATUS Public/Granted day:2011-09-29
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