Invention Grant
US08277929B2 Method for modifying surface of substrate, substrate having modified surface, and method for producing same
失效
用于改性基材表面的方法,具有改性表面的基材及其制备方法
- Patent Title: Method for modifying surface of substrate, substrate having modified surface, and method for producing same
- Patent Title (中): 用于改性基材表面的方法,具有改性表面的基材及其制备方法
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Application No.: US11722054Application Date: 2005-12-16
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Publication No.: US08277929B2Publication Date: 2012-10-02
- Inventor: Mikito Yasuzawa , Takashi Koide
- Applicant: Mikito Yasuzawa , Takashi Koide
- Applicant Address: JP Tokushima
- Assignee: The University of Tokushima
- Current Assignee: The University of Tokushima
- Current Assignee Address: JP Tokushima
- Agency: Griffin & Szipl, P.C.
- Priority: JP2004-365903 20041217
- International Application: PCT/JP2005/023177 WO 20051216
- International Announcement: WO2006/064918 WO 20060622
- Main IPC: B32B27/32
- IPC: B32B27/32 ; B32B9/04 ; B05D1/40 ; B05D3/02

Abstract:
A method for modifying the surface of a substrate includes the following steps: (1) a step for forming a polysilazane coating by applying a polysilazane onto the surface of a substrate; (2) a step for applying an organic compound of which main backbone comprises an organic group represented by the following formula [1]: —[(R)mO]n— (wherein R represents an alkylene group, and m and n respectively represent a positive number of not less than 1) onto the surface of the polysilazane coating; and (3) a step for heating the substrate having undergone the steps (1) and (2), thereby converting the polysilazane to silica and bonding the organic compound to the silica of the silica layer.
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