Invention Grant
- Patent Title: Film stress management for MEMS through selective relaxation
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Application No.: US13358615Application Date: 2012-01-26
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Publication No.: US08304276B2Publication Date: 2012-11-06
- Inventor: George Patrick Watson
- Applicant: George Patrick Watson
- Applicant Address: FR Paris
- Assignee: Alcatel Lucent
- Current Assignee: Alcatel Lucent
- Current Assignee Address: FR Paris
- Agency: Hitt Gaines, PC
- Main IPC: H01L21/00
- IPC: H01L21/00
Abstract:
An apparatus comprising a microelectromechanical system. The microelectromechanical system includes a crystalline structural element having dislocations therein. For at least about 60 percent of adjacent pairs of the dislocations, direction vectors of the dislocations form acute angles of less than about 45 degrees.
Public/Granted literature
- US20120122300A1 FILM STRESS MANAGEMENT FOR MEMS THROUGH SELECTIVE RELAXATION Public/Granted day:2012-05-17
Information query
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