Invention Grant
- Patent Title: Respiratory mask including an adjustment unit
- Patent Title (中): 呼吸面罩包括调节单元
-
Application No.: US12610828Application Date: 2009-11-02
-
Publication No.: US08365735B2Publication Date: 2013-02-05
- Inventor: Eric Chang
- Applicant: Eric Chang
- Applicant Address: TW Taichung Hsien
- Assignee: Hsiner Co., Ltd.
- Current Assignee: Hsiner Co., Ltd.
- Current Assignee Address: TW Taichung Hsien
- Agency: DLA Piper LLP (US)
- Priority: TW98128675A 20090826
- Main IPC: A62B18/08
- IPC: A62B18/08

Abstract:
A respiratory mask includes: a mask body including a mask shell, and a mask cushion connected to a rear side of the mask shell; a front cover disposed in front of and hinged to the mask shell, and having a support arm extending upwardly; a forehead support unit having a forehead frame connected to a top end of the support arm, and a forehead pad connected to a rear side of the forehead frame; and an adjustment unit connected to at least one of the mask shell and the front cover, and operable to produce relative movements of the mask shell and the front cover so that the mask body can abut against the user's nose with an appropriate abutment pressure.
Public/Granted literature
- US20110048425A1 RESPIRATORY MASK INCLUDING AN ADJUSTMENT UNIT Public/Granted day:2011-03-03
Information query
IPC分类: