Invention Grant
- Patent Title: Uniformity of a scanned ion beam
- Patent Title (中): 扫描离子束的均匀性
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Application No.: US13077112Application Date: 2011-03-31
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Publication No.: US08378313B2Publication Date: 2013-02-19
- Inventor: Edward C. Eisner , Andy Ray , Bo H. Vanderberg
- Applicant: Edward C. Eisner , Andy Ray , Bo H. Vanderberg
- Applicant Address: US MA Beverly
- Assignee: Axcelis Technologies, Inc.
- Current Assignee: Axcelis Technologies, Inc.
- Current Assignee Address: US MA Beverly
- Agency: Eschweiler & Associates, LLC
- Main IPC: H01J3/26
- IPC: H01J3/26 ; H01J37/147
Abstract:
One embodiment relates to an ion implanter. The ion implanter includes an ion source to generate an ion beam, as well as a scanner to scan the ion beam across a surface of a workpiece along a first axis. The ion implanter also includes a deflection filter downstream of the scanner to ditheredly scan the ion beam across the surface of the workpiece along a second axis.
Public/Granted literature
- US20120248326A1 Uniformity of a Scanned Ion Beam Public/Granted day:2012-10-04
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