Invention Grant
US08395078B2 Arc recovery with over-voltage protection for plasma-chamber power supplies 有权
用于等离子体室电源的过电压保护的电弧恢复

Arc recovery with over-voltage protection for plasma-chamber power supplies
Abstract:
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
Information query
Patent Agency Ranking
0/0