Invention Grant
US08410205B2 Matting agent composition containing low molecular weight polytrimethylene ether glycol
失效
含有低分子量聚三亚甲基醚二醇的消光剂组合物
- Patent Title: Matting agent composition containing low molecular weight polytrimethylene ether glycol
- Patent Title (中): 含有低分子量聚三亚甲基醚二醇的消光剂组合物
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Application No.: US13047085Application Date: 2011-03-14
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Publication No.: US08410205B2Publication Date: 2013-04-02
- Inventor: Rajesh Gopalan Saliya , Ayumu Yokoyama , Hari Babu Sunkara
- Applicant: Rajesh Gopalan Saliya , Ayumu Yokoyama , Hari Babu Sunkara
- Applicant Address: US DE Wilmington
- Assignee: E I du Pont de Nemours and Company
- Current Assignee: E I du Pont de Nemours and Company
- Current Assignee Address: US DE Wilmington
- Agent Gann G. Xu
- Main IPC: C08K5/06
- IPC: C08K5/06 ; B05D3/02
Abstract:
The present invention is directed to a matting agent for reducing gloss of a coating. The matting agent comprises: a) a silica component; b) a polytrimethylene ether glycol; c) one or more solvents; and d) optionally, one or more polymers. This invention is further directed to a matting agent comprising components derived from renewable resources.
Public/Granted literature
- US20120053277A1 MATTING AGENT COMPOSITION CONTAINING LOW MOLECULAR WEIGHT POLYTRIMETHYLENE ETHER GLYCOL Public/Granted day:2012-03-01
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