Invention Grant
- Patent Title: Manufacturing method for an electronic substrate
- Patent Title (中): 电子基板的制造方法
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Application No.: US12782076Application Date: 2010-05-18
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Publication No.: US08416578B2Publication Date: 2013-04-09
- Inventor: Nobuaki Hashimoto
- Applicant: Nobuaki Hashimoto
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2005-197393 20050706
- Main IPC: H05K7/02
- IPC: H05K7/02 ; H05K7/06 ; H05K7/08 ; H05K7/10

Abstract:
The manufacturing method for electronic substrate includes: forming an active region on a first face of a substrate; forming a first part of an interconnection pattern as a passive element on a second face of the substrate; forming an insulating layer as a stress-relieving layer on the second face of the substrate; and forming a second part of the interconnection pattern as the passive element on the insulating layer.
Public/Granted literature
- US20100223784A1 ELECTRONIC SUBSTRATE, MANUFACTURING METHOD FOR ELECTRONIC SUBSTRATE, AND ELECTRONIC DEVICE Public/Granted day:2010-09-09
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