Invention Grant
US08455824B2 Charged particle beam apparatus, and sample processing and observation method
有权
带电粒子束装置,以及样品处理和观察方法
- Patent Title: Charged particle beam apparatus, and sample processing and observation method
- Patent Title (中): 带电粒子束装置,以及样品处理和观察方法
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Application No.: US13601893Application Date: 2012-08-31
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Publication No.: US08455824B2Publication Date: 2013-06-04
- Inventor: Hiroyuki Muto , Tsuyoshi Ohnishi , Isamu Sekihara
- Applicant: Hiroyuki Muto , Tsuyoshi Ohnishi , Isamu Sekihara
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2007-188986 20070720
- Main IPC: H01J45/00
- IPC: H01J45/00 ; H01J37/04 ; G01N23/225

Abstract:
An object of the present invention relates to realizing the processing of a sample by charged particle beams and the monitoring of the processed cross-section with a high throughput. It is possible to process an accurate sample without an intended region lost even when the location and the size of the intended region are unknown by: observing a cross-sectional structure being processed by FIBs by using a secondary particle image generated from a sample by the ion beams shaving a cross section; forming at least two cross sections; and processing the sample while the processing and the monitoring of a processed cross section are carried out.
Public/Granted literature
- US20120326028A1 CHARGED PARTICLE BEAM APPARATUS, AND SAMPLE PROCESSING AND OBSERVATION METHOD Public/Granted day:2012-12-27
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