Invention Grant
- Patent Title: Material gas concentration control system
- Patent Title (中): 物质气体浓度控制系统
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Application No.: US12610019Application Date: 2009-10-30
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Publication No.: US08459290B2Publication Date: 2013-06-11
- Inventor: Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
- Applicant: Masakazu Minami , Daisuke Hayashi , Yuhei Sakaguchi , Katsumi Nishimura , Masaki Inoue , Kotaro Takijiri
- Applicant Address: JP Kyoto-shi JP Kyoto-shi
- Assignee: Horiba, Ltd.,Horiba Stec, Co., Ltd.
- Current Assignee: Horiba, Ltd.,Horiba Stec, Co., Ltd.
- Current Assignee Address: JP Kyoto-shi JP Kyoto-shi
- Agency: Alleman Hall McCoy Russell & Tuttle LLP
- Priority: JP2008-282622 20081031; JP2008-282624 20081031; JP2008-282625 20081031
- Main IPC: B05C11/00
- IPC: B05C11/00

Abstract:
A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration.
Public/Granted literature
- US20100108154A1 MATERIAL GAS CONCENTRATION CONTROL SYSTEM Public/Granted day:2010-05-06
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