Invention Grant
US08475727B2 Pressure and temperature control system for at least one chemical reactor
有权
至少一个化学反应器的压力和温度控制系统
- Patent Title: Pressure and temperature control system for at least one chemical reactor
- Patent Title (中): 至少一个化学反应器的压力和温度控制系统
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Application No.: US13081555Application Date: 2011-04-07
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Publication No.: US08475727B2Publication Date: 2013-07-02
- Inventor: Martin Hitzl
- Applicant: Martin Hitzl
- Applicant Address: ES Valencia
- Assignee: Ingelia, S.L.
- Current Assignee: Ingelia, S.L.
- Current Assignee Address: ES Valencia
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: ES200803271 20081117; ES200803272 20081117
- Main IPC: F28D21/00
- IPC: F28D21/00 ; B01J19/00 ; B01J8/00 ; C10L1/00 ; C10L1/10

Abstract:
This invention relates to a new system for controlling temperature and pressure in, at least, one chemical reactor, characterized in that it includes, at least, the following devices: a) a deposit with at least one pressure regulation device; b) a connecting duct between said deposit and the reactor; c) a device for injecting condensates into the reactor. Moreover, the invention relates to the use of said control system to control the pressure and temperature of at least one chemical reactor, being especially applicable to a chemical reactor in which a hydrothermal biomass carbonization reaction takes place.
Public/Granted literature
- US20110225876A1 PRESSURE AND TEMPERATURE CONTROL SYSTEM FOR AT LEAST ONE CHEMICAL REACTOR Public/Granted day:2011-09-22
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