Invention Grant
- Patent Title: Projection optical system, exposure apparatus, and device manufacturing method
- Patent Title (中): 投影光学系统,曝光装置和装置制造方法
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Application No.: US12720080Application Date: 2010-03-09
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Publication No.: US08477286B2Publication Date: 2013-07-02
- Inventor: Yuhei Sumiyoshi
- Applicant: Yuhei Sumiyoshi
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2009-054815 20090309
- Main IPC: G03B27/68
- IPC: G03B27/68 ; G03B27/32

Abstract:
A projection optical system is configured to project an image of an object plane onto an image plane, and includes a first optical element having an aspheric shape that is rotationally asymmetric with respect to an optical axis, a moving unit configured to move the first optical element in a direction perpendicular to the optical axis, and a second optical element fixed on the optical axis, and configured to reduce an optical path length difference caused by an aspheric surface of the first optical element, the second optical element having no aspheric shape complement to the aspheric shape of the first optical element.
Public/Granted literature
- US20100225889A1 PROJECTION OPTICAL SYSTEM, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD Public/Granted day:2010-09-09
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