Invention Grant
- Patent Title: Microplasma ion source for focused ion beam applications
- Patent Title (中): 用于聚焦离子束应用的微量离子源
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Application No.: US13407549Application Date: 2012-02-28
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Publication No.: US08481966B1Publication Date: 2013-07-09
- Inventor: Vladimir V. Makarov , Sergey Macheret
- Applicant: Vladimir V. Makarov , Sergey Macheret
- Applicant Address: US CA Milpitas
- Assignee: Tiza Lab, L.L.C.
- Current Assignee: Tiza Lab, L.L.C.
- Current Assignee Address: US CA Milpitas
- Agent Barry N. Young
- Main IPC: H01J37/08
- IPC: H01J37/08 ; H01J49/40 ; A61L2/14 ; H01J37/32 ; H01J37/317 ; H01J27/26 ; H01J49/16
Abstract:
A high pressure microplasma source operating in a normal glow discharge regime is used to produce a cold bright focused beam of Xe+ and/or Xe2+ ions having ion temperature of the order of 0.5-1 eV and a current density on the order of 0.1-1 A/cm2 or higher for focused ion beam applications.
Public/Granted literature
- US2652371A Process of forming spheroidal catalyst particles Public/Granted day:1953-09-15
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