Invention Grant
- Patent Title: Complex oxide film and method for producing same, composite body and method for producing same, dielectric material, piezoelectric material, capacitor, piezoelectric element and electronic device
- Patent Title (中): 复合氧化物膜及其制造方法,复合体及其制造方法,介电材料,压电材料,电容器,压电元件和电子器件
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Application No.: US12159492Application Date: 2006-12-27
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Publication No.: US08486492B2Publication Date: 2013-07-16
- Inventor: Akihiko Shirakawa
- Applicant: Akihiko Shirakawa
- Applicant Address: JP Tokyo
- Assignee: Showa Denko K.K.
- Current Assignee: Showa Denko K.K.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2005-377039 20051228
- International Application: PCT/JP2006/326088 WO 20061227
- International Announcement: WO2007/074874 WO 20070705
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B05D3/14

Abstract:
The invention aims at providing a complex oxide film having a high relative dielectric constant and a high voltage resistance, whose film thickness can be arbitrarily controlled, and a manufacturing method thereof, a composite body comprising the complex oxide film and a manufacturing method thereof, a dielectric or piezoelectric material comprising the complex oxide film or composite body, a capacitor or piezoelectric element comprising the complex oxide film advantageous to improve voltage resistance, and an electronic device equipped with the same, without involving any complicated or large scale equipment. The complex oxide film can be obtained by forming a metal oxide film containing a titanium element on a substrate surface and then allowing a solution containing strontium ion to react with the metal oxide film. A capacitor including the complex oxide film as dielectric material and a piezoelectric element including it as piezoelectric material can be produced.
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