Invention Grant
- Patent Title: Electrostatic discharge protection device and applications thereof
- Patent Title (中): 静电放电保护装置及其应用
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Application No.: US13214627Application Date: 2011-08-22
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Publication No.: US08492834B2Publication Date: 2013-07-23
- Inventor: Tai-Hsiang Lai , Lu-An Chen , Tien-Hao Tang
- Applicant: Tai-Hsiang Lai , Lu-An Chen , Tien-Hao Tang
- Applicant Address: TW Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: WPAT, PC
- Agent Justin King
- Main IPC: H01L29/66
- IPC: H01L29/66 ; H01L23/62

Abstract:
An electrostatic discharge protection device comprises a substrate with a first conductivity, a gate, a drain structure and a source structure. The gate is disposed on a surface of the substrate. The drain structure with a second conductivity type comprises a first doping region with a first doping concentration disposed adjacent to the gate and extending into the substrate from the surface of the substrate, a second doping region extending into and stooped at the first doping region from the surface of the substrate and having a second doping concentration substantially greater than the first doping concentration, and a third doping region disposed in the substrate beneath the second doping region and having a third doping concentration substantially greater than the first doping concentration. The source structure with the second conductivity is disposed in the substrate and adjacent to the gate electrode.
Public/Granted literature
- US20130049112A1 ELECTROSTATIC DISCHARGE PROTECTION DEVICE AND APPLICATIONS THEREOF Public/Granted day:2013-02-28
Information query
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