Invention Grant
- Patent Title: Differential varactor device
- Patent Title (中): 差分变容管装置
-
Application No.: US13178506Application Date: 2011-07-08
-
Publication No.: US08502348B2Publication Date: 2013-08-06
- Inventor: Yue-Shiun Lee , Cheng-Hsiung Chen , Meng-Fan Wang
- Applicant: Yue-Shiun Lee , Cheng-Hsiung Chen , Meng-Fan Wang
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L29/93
- IPC: H01L29/93

Abstract:
The present invention provides a differential varactor device including a substrate having a first conductive type, a well having a second conductive type, five doped regions having the second conductive type, a first gate, a second gate, a third gate, and a fourth gate. The well is disposed in the substrate, and the doped regions are disposed in the well and arranged along a direction. The first gate, the second gate, the third gate and the fourth gate are respectively disposed on the well between any two of the adjacent doped regions, and are arranged sequentially along the direction.
Public/Granted literature
- US20130009228A1 DIFFERENTIAL VARACTOR DEVICE Public/Granted day:2013-01-10
Information query
IPC分类: