Invention Grant
- Patent Title: Semiconductor substrates comprising through substrate interconnects that are visible on the substrate backside
- Patent Title (中): 包括在衬底背面可见的通过衬底互连的半导体衬底
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Application No.: US13099672Application Date: 2011-05-03
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Publication No.: US08531046B2Publication Date: 2013-09-10
- Inventor: Dave Pratt , Kyle K. Kirby , Steve Oliver , Mark Hiatt
- Applicant: Dave Pratt , Kyle K. Kirby , Steve Oliver , Mark Hiatt
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John, P.S.
- Main IPC: H01L23/544
- IPC: H01L23/544

Abstract:
The invention includes methods of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit, methods of positioning a semiconductor substrate comprising an integrated circuit, methods of processing a semiconductor substrate, and semiconductor devices. In one implementation, a method of determining x-y spatial orientation of a semiconductor substrate comprising an integrated circuit includes providing a semiconductor substrate comprising at least one integrated circuit die. The semiconductor substrate comprises a circuit side, a backside, and a plurality of conductive vias extending from the circuit side to the backside. The plurality of conductive vias on the semiconductor substrate backside is examined to determine location of portions of at least two of the plurality of conductive vias on the semiconductor substrate backside. From the determined location, x-y spatial orientation of the semiconductor substrate is determined. Other aspects and implementations are contemplated.
Public/Granted literature
Information query
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