Invention Grant
US08536481B2 Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma 有权
电极组件,等离子体装置和包括电极组件的系统以及用于产生等离子体的方法

Electrode assemblies, plasma apparatuses and systems including electrode assemblies, and methods for generating plasma
Abstract:
Electrode assemblies for plasma reactors include a structure or device for constraining an arc endpoint to a selected area or region on an electrode. In some embodiments, the structure or device may comprise one or more insulating members covering a portion of an electrode. In additional embodiments, the structure or device may provide a magnetic field configured to control a location of an arc endpoint on the electrode. Plasma generating modules, apparatus, and systems include such electrode assemblies. Methods for generating a plasma include covering at least a portion of a surface of an electrode with an electrically insulating member to constrain a location of an arc endpoint on the electrode. Additional methods for generating a plasma include generating a magnetic field to constrain a location of an arc endpoint on an electrode.
Information query
Patent Agency Ranking
0/0