Invention Grant
US08539907B2 Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate
有权
用于两个盖之间的化学浴沉积的装置，其中盖是基底
- Patent Title: Apparatus for chemical bath deposition between two covers, wherein a cover is a substrate
- Patent Title (中): 用于两个盖之间的化学浴沉积的装置，其中盖是基底
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Application No.: US13090219Application Date: 2011-04-19
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Publication No.: US08539907B2Publication Date: 2013-09-24
- Inventor: Wei-Tse Hsu , Chung-Wen Lan , Yi-Song Luo
- Applicant: Wei-Tse Hsu , Chung-Wen Lan , Yi-Song Luo
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Priority: TW99141425A 20101130
- Main IPC: B05C3/00
- IPC: B05C3/00 ; B05C19/02 ; B05D1/18 ; C25D1/12 ; C25D13/00
Abstract:
The invention provides a film deposition apparatus, which includes a first cover and a second cover, wherein the first cover and the second cover are disposed opposite to each other, and the first cover has at least two holes, and a spacer disposed between the first cover and the second cover, wherein the first cover, the spacer and the second cover form a film deposition space.
Public/Granted literature
- US20120132134A1 APPARATUS FOR CHEMICAL BATH DEPOSITION Public/Granted day:2012-05-31
Information query
