BEE'S WAX FRAME/FOUNDATION DIPPING STATION

    公开(公告)号:US20210016313A1

    公开(公告)日:2021-01-21

    申请号:US16931691

    申请日:2020-07-17

    Abstract: A dipping station is provided for coating bee hive frame members with a coating of wax. The dipping station comprises a housing having a reservoir for receiving a supply of melted wax. The reservoir approximates the dimension of a frame member. The dipping station is provided with a heating element to melt the wax placed in the reservoir. Water is added to the reservoir to avoid overheating the wax. Individual frame members are dipped into the reservoir containing the melted wax whereby they are coated with melted wax as they are dipped into and removed from the reservoir.

    Condensation apparatus
    4.
    发明授权

    公开(公告)号:US10792694B2

    公开(公告)日:2020-10-06

    申请号:US15867672

    申请日:2018-01-10

    Abstract: Apparatuses for increasing the effective size of gas-entrained particles in a particle detector are disclosed. In one embodiment, an apparatus comprises an evaporation chamber, a condenser in fluid communication with the evaporation chamber, and an inlet in fluid communication with the condenser for receiving a stream of sample gas containing gas-entrained particles. The evaporation chamber includes a heating element and a porous support surrounding the heating element. The porous support carries thereon a working fluid, and the heating element vaporizes the working fluid to form vapor within the evaporation chamber. The porous support may include a portion which extends into a working fluid reservoir.

    Valve arrangement for applying fluid media to surfaces

    公开(公告)号:US10035167B2

    公开(公告)日:2018-07-31

    申请号:US15112440

    申请日:2015-01-22

    Abstract: A valve arrangement for applying fluid media, in particular glue, to surfaces, comprising a plurality of individual modules detachably connected to form a row, wherein in the row and between the adjacent individual modules is respectively formed a dividing plane, in which the respectively adjacent individual modules bear one against another, and at least one dividing plane is assigned a heating member for warming the valve arrangement, preferably a plurality of or all dividing planes are respectively assigned a heating member, which is seated in appropriate, mutually opposing receptacles, arranged to both sides of the dividing plane, of the two adjacent individual modules, and cooperates in such a way with those walls of the individual modules which delimit the receptacles that relative movements of the two individual modules in at least one spatial direction are limited or prevented.

    Apparatus for dipping substrate
    6.
    发明授权

    公开(公告)号:US09795982B2

    公开(公告)日:2017-10-24

    申请号:US14892900

    申请日:2015-05-19

    Inventor: Eun-Ah You

    CPC classification number: B05C3/02 B05C3/04 B05C13/02 C25D17/00

    Abstract: An apparatus for dipping a substrate includes: a body having an internal plate formed therein, and including a backing plate provided over the internal plate; a crucible accommodating an aqueous solution therein and provided over the backing plate; a crucible driving unit provided in the body and connected to the crucible to move the crucible in a horizontal direction or a vertical direction of the body; a support having a lower end to which a substrate is fixed; a support driving unit provided to an upper side of the body and connected to the support to drive the support in a length direction of the support or rotate the support in the vertical direction of the body; and a controlling unit connected to the crucible driving unit and the support driving unit to control driving of the crucible driving unit and the support driving unit.

    Dye adsorption apparatus and dye adsorption method
    8.
    发明授权
    Dye adsorption apparatus and dye adsorption method 有权
    染料吸附装置和染料吸附法

    公开(公告)号:US09093222B2

    公开(公告)日:2015-07-28

    申请号:US13989151

    申请日:2011-09-27

    Abstract: Provided is a dye adsorption unit including a processing tank of which the upper surface is opened, in order to perform a batch dye adsorption process for a predetermined number of substrates. The dye adsorption unit further includes, as a moving system around the processing tank, a boat capable of going in and out of the processing tank from the upper opening, a boat transport unit that serves for the boat to go in and out of the processing tank, and a top cover for detachably closing the upper opening. Further, the dye adsorption unit includes a dye solution supply unit for supplying the dye solution into the processing tank, and a flow control unit for controlling the flow of the dye solution in the processing tank during the dye adsorption processing.

    Abstract translation: 提供了一种染料吸附单元,其包括上表面打开的处理槽,以便对预定数量的基材进行分批染料吸附处理。 染料吸附单元还包括作为围绕处理罐的移动系统的能够从上部开口进出处理槽的船,用于船进出加工的船运输单元 罐和顶盖,用于可拆卸地封闭上部开口。 此外,染料吸附单元包括用于将染料溶液供给到处理槽中的染料溶液供给单元和用于在染料吸附处理期间控制处理槽中的染料溶液的流动的流量控制单元。

    SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM
    9.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER-READABLE STORAGE MEDIUM STORING SUBSTRATE PROCESSING PROGRAM 有权
    基板处理装置,基板处理方法和计算机可读存储介质存储基板处理程序

    公开(公告)号:US20150165471A1

    公开(公告)日:2015-06-18

    申请号:US14570266

    申请日:2014-12-15

    Abstract: A substrate processing apparatus includes one or more substrate processing units 11 to 18 each processing a substrate 3 with a processing fluid; processing fluid supply units 19 and 20 supplying the heated processing fluid to the substrate processing units 11 to 18; and a controller 21 controlling the processing fluid supply units 19 and 20. The processing fluid supply units 19 and 20 include a storage tank 35 storing the processing fluid; a heating heat exchanger 51 heating the processing fluid; and a supply path 52 supplying the processing fluid to the substrate processing units 11 to 18. The supply path 52 includes a bypass path 71 bypassing the heating heat exchanger 51 at an upstream of the substrate processing units 11 to 18. The processing fluid heated by the heating heat exchanger 51 and the processing fluid supplied from the bypass path 71 are mixed to be supplied.

    Abstract translation: 基板处理装置包括:一个或多个基板处理单元11至18,每个基板处理单元用处理流体处理基板3; 将加热的处理流体供给到基板处理单元11至18的处理流体供应单元19和20; 以及控制处理流体供给单元19和20的控制器21.处理流体供应单元19和20包括存储处理流体的储存箱35; 加热热交换器51,加热处理流体; 以及将处理流体供给到基板处理单元11〜18的供给路径52.供给路径52包括在基板处理单元11〜18的上游旁通加热用热交换器51的旁路路径71.加热流体被加热 加热热交换器51和从旁路通路71供给的处理液被混合供给。

    Alteration of graphene defects
    10.
    发明授权
    Alteration of graphene defects 有权
    改变石墨烯缺陷

    公开(公告)号:US09011968B2

    公开(公告)日:2015-04-21

    申请号:US13391158

    申请日:2011-09-16

    Abstract: Technologies are generally described for method and systems effective to at least partially alter a defect in a layer including graphene. In some examples, the methods may include receiving the layer on a substrate where the layer includes at least some graphene and at least some defect areas in the graphene. The defect areas may reveal exposed areas of the substrate. The methods may also include reacting the substrate under sufficient reaction conditions to produce at least one cationic area in at least one of the exposed areas. The methods may further include adhering graphene oxide to the at least one cationic area to produce a graphene oxide layer. The methods may further include reducing the graphene oxide layer to produce at least one altered defect area in the layer.

    Abstract translation: 通常描述了有效地至少部分地改变包括石墨烯的层中的缺陷的方法和系统的技术。 在一些示例中,所述方法可以包括在衬底上接收该层,其中层包括至少一些石墨烯和石墨烯中的至少一些缺陷区域。 缺陷区域可能暴露基底的暴露区域。 所述方法还可包括在足够的反应条件下使底物反应以在至少一个暴露区域中产生至少一个阳离子区域。 所述方法还可以包括将氧化石墨烯粘附到至少一个阳离子区域以产生氧化石墨烯氧化物层。 所述方法还可以包括减少石墨烯氧化物层以在该层中产生至少一个改变的缺陷区域。

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