Invention Grant
US08542356B2 Measurement method and measurement system for measuring birefringence
有权
用于测量双折射的测量方法和测量系统
- Patent Title: Measurement method and measurement system for measuring birefringence
- Patent Title (中): 用于测量双折射的测量方法和测量系统
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Application No.: US13237000Application Date: 2011-09-20
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Publication No.: US08542356B2Publication Date: 2013-09-24
- Inventor: Damian Fiolka , Marc Rohe
- Applicant: Damian Fiolka , Marc Rohe
- Applicant Address: DE Oberkochen
- Assignee: Carl Zeiss SMT GmbH
- Current Assignee: Carl Zeiss SMT GmbH
- Current Assignee Address: DE Oberkochen
- Agency: Sughrue Mion, PLLC
- Priority: DE102009015393 20090320
- Main IPC: G01J4/00
- IPC: G01J4/00

Abstract:
A method measuring the birefringence of an object. A measurement beam having a defined input polarization state is generated, the measurement beam being directed onto the object. Polarization properties of the measurement beam after interaction with the object are detected in order to generate polarization measurement values representing an output polarization state of the measurement beam after interaction with the object. The input polarization state of the measurement beam is modulated into at least four different measurement states in accordance with a periodic modulation function of an angle parameter α, and the polarization measurement values associated with the at least four measurement states are processed to form a measurement function dependent on the angle parameter α. A two-wave portion of the measurement function is determined and analysed in order to derive at least one birefringence parameter describing the birefringence, preferably by double Fourier transformation of the measurement function.
Public/Granted literature
- US20120092669A1 MEASUREMENT METHOD AND MEASUREMENT SYSTEM FOR MEASURING BIREFRINGENCE Public/Granted day:2012-04-19
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