Invention Grant
- Patent Title: Inverter structure and method for fabricating the same
- Patent Title (中): 逆变器结构及其制造方法
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Application No.: US12324860Application Date: 2008-11-27
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Publication No.: US08546890B2Publication Date: 2013-10-01
- Inventor: Chien-Li Kuo , Chia-Chun Sun , Chuan-Hsien Fu , Chun-Liang Hou , Yun-San Huang
- Applicant: Chien-Li Kuo , Chia-Chun Sun , Chuan-Hsien Fu , Chun-Liang Hou , Yun-San Huang
- Applicant Address: TW Science-Based Industrial Park, Hsin-Chu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Science-Based Industrial Park, Hsin-Chu
- Agent Winston Hsu; Scott Margo
- Main IPC: H01L21/8238
- IPC: H01L21/8238 ; H01L21/8244 ; H01L27/092

Abstract:
An inverter structure is disclosed. The inverter structure includes an NMOS transistor and a PMOS transistor. Preferably, the NMOS transistor includes an n-type gate electrode and an n-type source/drain region, and the PMOS transistor includes a p-type gate electrode and a p-type source/drain region. Specifically, the n-type gate electrode and the p-type gate electrode are physically separated and electrically connected by a conductive contact.
Public/Granted literature
- US20100127337A1 INVERTER STRUCTURE AND METHOD FOR FABRICATING THE SAME Public/Granted day:2010-05-27
Information query
IPC分类: