Invention Grant
- Patent Title: Alkali developable photosensitive resin composition and dry film manufactured by the same
- Patent Title (中): 碱显影性感光性树脂组合物及其制造的干膜
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Application No.: US12451505Application Date: 2008-08-20
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Publication No.: US08551687B2Publication Date: 2013-10-08
- Inventor: Kwang-Joo Lee , Heon-Sik Song , You-Jin Kyung , Joo-Eun Ko , Jung-Il Yoon , Jung-Jin Shim
- Applicant: Kwang-Joo Lee , Heon-Sik Song , You-Jin Kyung , Joo-Eun Ko , Jung-Il Yoon , Jung-Jin Shim
- Applicant Address: KR Seoul
- Assignee: LG Chem, Ltd.
- Current Assignee: LG Chem, Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna, Long & Aldridge, LLP
- Priority: KR10-2007-0083555 20070820
- International Application: PCT/KR2008/004850 WO 20080820
- International Announcement: WO2009/025498 WO 20090226
- Main IPC: G03F7/027
- IPC: G03F7/027 ; G03F7/004 ; G03F7/037 ; G03F7/028 ; G03F7/031 ; G03C1/04 ; C08F2/52 ; C08J3/28
Abstract:
The present invention relates to a polyimide photosensitive resin composition that is capable of being developed by an alkali aqueous solution, and a dry film that is produced by the same, and more particularly to a photosensitive resin composition which comprises a) a polyamic acid, b) two or more (meth)acrylate—based compounds that include one or more double bonds between carbons, c) a photopolymerization initiator, d) a phosphorus—based flame retardant, and e) an organic solvent, and a dry film that is produced by the same.
Public/Granted literature
- US20100113640A1 ALKALI DEVELOPABLE PHOTOSENSITIVE RESIN COMPOSITION AND DRY FILM MANUFACTURED BY THE SAME Public/Granted day:2010-05-06
Information query
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