Invention Grant
- Patent Title: Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
- Patent Title (中): 检测方法和装置，光刻设备，光刻处理单元和器件制造方法
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Application No.: US12486449Application Date: 2009-06-17
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Publication No.: US08553227B2Publication Date: 2013-10-08
- Inventor: Cvetanka Jordanoska
- Applicant: Cvetanka Jordanoska
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G01J4/00
- IPC: G01J4/00
Abstract:
An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.
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