Invention Grant
- Patent Title: Methods for synthesizing submicron doped silicon particles
- Patent Title (中): 合成亚微米掺杂硅颗粒的方法
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Application No.: US12686803Application Date: 2010-01-13
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Publication No.: US08568684B2Publication Date: 2013-10-29
- Inventor: Xiangxin Bi , Nobuyuki Kambe , James T. Gardner , Ronald J. Mosso , Shivkumar Chiruvolu , Sujeet Kumar , William E. McGovern
- Applicant: Xiangxin Bi , Nobuyuki Kambe , James T. Gardner , Ronald J. Mosso , Shivkumar Chiruvolu , Sujeet Kumar , William E. McGovern
- Applicant Address: US CA Milpitas
- Assignee: NanoGram Corporation
- Current Assignee: NanoGram Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Dardi & Herbert, PLLC
- Agent Peter S. Dardi; Nikhil Patel
- Main IPC: C01B33/02
- IPC: C01B33/02

Abstract:
Methods are described that have the capability of producing submicron/nanoscale particles, in some embodiments dispersible, at high production rates. In some embodiments, the methods result in the production of particles with an average diameter less than about 75 nanometers that are produced at a rate of at least about 35 grams per hour. In other embodiments, the particles are highly uniform. These methods can be used to form particle collections and/or powder coatings. Powder coatings and corresponding methods are described based on the deposition of highly uniform submicron/nanoscale particles.
Public/Granted literature
- US20120244060A9 METHODS FOR SYNTHESIZING SUBMICRON DOPED SILICON PARTICLES Public/Granted day:2012-09-27
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