Invention Grant
- Patent Title: Cleaning apparatus, measurement method and calibration method
- Patent Title (中): 清洁装置,测量方法和校准方法
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Application No.: US13618624Application Date: 2012-09-14
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Publication No.: US08575571B2Publication Date: 2013-11-05
- Inventor: Teruo Haibara , Yoshihiro Mori , Etsuko Kubo , Masashi Uchibe
- Applicant: Teruo Haibara , Yoshihiro Mori , Etsuko Kubo , Masashi Uchibe
- Applicant Address: DE Munich
- Assignee: Siltronic AG
- Current Assignee: Siltronic AG
- Current Assignee Address: DE Munich
- Agency: Leydig, Voit & Mayer, Ltd.
- Priority: JP2011-242129 20111104
- Main IPC: G01J1/58
- IPC: G01J1/58

Abstract:
A calibration method for calibrating a measurement device for measuring a concentration of a gas dissolved in a liquid includes varying the concentration of the gas dissolved in the liquid, and predetermining, as a reference concentration, a concentration of the gas at which an intensity of luminescence produced when the liquid is irradiated with ultrasonic waves shows a peak. The liquid is illuminated with ultrasonic waves while varying the concentration of the gas in the liquid and a measured value is measured, using the measurement device, as a concentration of the gas in the liquid when the intensity of the luminescence shows a peak. The measurement device is calibrated based on the measured value and the reference concentration.
Public/Granted literature
- US20130112900A1 CLEANING APPARATUS, MEASUREMENT METHOD AND CALIBRATION METHOD Public/Granted day:2013-05-09
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