Invention Grant
US08582094B1 Systems and methods for inspecting specimens including specimens that have a substantially rough uppermost layer
有权
用于检查样品的系统和方法，包括具有基本粗糙的最上层的样品
- Patent Title: Systems and methods for inspecting specimens including specimens that have a substantially rough uppermost layer
- Patent Title (中): 用于检查样品的系统和方法，包括具有基本粗糙的最上层的样品
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Application No.: US11110383Application Date: 2005-04-20
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Publication No.: US08582094B1Publication Date: 2013-11-12
- Inventor: David Shortt , Stephen Biellak , Christian Wolters
- Applicant: David Shortt , Stephen Biellak , Christian Wolters
- Applicant Address: US CA Milpitas
- Assignee: KLA-Tencor Technologies Corp.
- Current Assignee: KLA-Tencor Technologies Corp.
- Current Assignee Address: US CA Milpitas
- Agent Ann Marie Mewherter
- Main IPC: G01N21/00
- IPC: G01N21/00 ; G01J4/00
Abstract:
Systems and methods for inspecting a specimen are provided. One system includes an illumination subsystem configured to direct light to the specimen at an oblique angle of incidence. The light is polarized in a plane that is substantially parallel to the plane of incidence. The system also includes a detection subsystem configured to detect light scattered from the specimen. The detected light is polarized in a plane that is substantially parallel to the plane of scattering. In addition, the system includes a processor configured to detect defects on the specimen using signals generated by the detection subsystem. In one embodiment, such a system may be configured to detect defects having a size that is less than half of a wavelength of the light directed to the specimen.
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