Invention Grant
- Patent Title: Electron beam layer manufacturing using scanning electron monitored closed loop control
- Patent Title (中): 使用扫描电子监测闭环控制的电子束层制造
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Application No.: US12902520Application Date: 2010-10-12
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Publication No.: US08598523B2Publication Date: 2013-12-03
- Inventor: Scott Stecker , Phillip E. Wollenhaupt
- Applicant: Scott Stecker , Phillip E. Wollenhaupt
- Applicant Address: US IL Chicago
- Assignee: Sciaky, Inc.
- Current Assignee: Sciaky, Inc.
- Current Assignee Address: US IL Chicago
- Agency: The Dobrusin Law Firm, P.C.
- Main IPC: B23K15/00
- IPC: B23K15/00 ; H01J37/305 ; H01J37/30

Abstract:
A process (and apparatus for performing the process) for layer manufacturing a three-dimensional work piece comprising the steps of: feeding raw material in a solid state to a first predetermined location; exposing the raw material to an electron beam to liquefy the raw material; depositing the raw material onto a substrate as a molten pool deposit, the deposit having a forward edge region in an x-y plane with a forward edge region width and a trailing edge region in the x-y plane with a trailing edge region width, under at least one first processing condition; monitoring the molten pool deposit for at least one preselected condition using detecting of scatter from a scanning electron beam contemporaneously with the depositing step; solidifying the molten pool deposit; automatically altering the first processing condition to a different processing condition based upon information obtained from the comparing step; and repeating steps at one or more second locations for building up layer by layer, generally along a z-axis that is orthogonal to the x-y plane, a three-dimensional work piece.
Public/Granted literature
- US20110114839A1 ELECTRON BEAM LAYER MANUFACTURING USING SCANNING ELECTRON MONITORED CLOSED LOOP CONTROL Public/Granted day:2011-05-19
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