Invention Grant
- Patent Title: High voltage shielding arrangement of a charged particle lithography system
- Patent Title (中): 带电粒子光刻系统的高压屏蔽布置
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Application No.: US12898665Application Date: 2010-10-05
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Publication No.: US08624478B2Publication Date: 2014-01-07
- Inventor: Johan Joost Koning , Stijn Willem Herman Steenbrink , Norman Hendrikus Rudolf Baars , Bart Schipper
- Applicant: Johan Joost Koning , Stijn Willem Herman Steenbrink , Norman Hendrikus Rudolf Baars , Bart Schipper
- Applicant Address: NL Delft
- Assignee: Mapper Lithography IP B.V.
- Current Assignee: Mapper Lithography IP B.V.
- Current Assignee Address: NL Delft
- Agency: Blakely Sokoloff Taylor & Zafman
- Main IPC: H01J1/52
- IPC: H01J1/52 ; H01J37/30 ; H01J37/04
Abstract:
The invention relates to a high voltage shielding arrangement comprising a first metal part and a second metal part positioned in close vicinity to said first metal part. Said second metal part included in said arrangement to be set at an electrical potential that is lower than the electric potential of the first metal part. Said second metal part having comprising one or more edges and an insulator. The second metal part is at least partially encapsulated by the insulator facing the first metal part.
Public/Granted literature
- US20110084592A1 HIGH VOLTAGE SHIELDING ARRANGEMENT Public/Granted day:2011-04-14
Information query
