Invention Grant
- Patent Title: Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications
- Patent Title (中): 硅/锗颗粒油墨,掺杂颗粒,半导体应用的印刷和工艺
-
Application No.: US12006453Application Date: 2008-01-02
-
Publication No.: US08632702B2Publication Date: 2014-01-21
- Inventor: Henry Hieslmair , Vladimir K. Dioumaev , Shivkumar Chiruvolu , Hui Du
- Applicant: Henry Hieslmair , Vladimir K. Dioumaev , Shivkumar Chiruvolu , Hui Du
- Applicant Address: US CA Milpitas
- Assignee: NanoGram Corporation
- Current Assignee: NanoGram Corporation
- Current Assignee Address: US CA Milpitas
- Agency: Dardi & Herbert, PLLC
- Agent Peter S. Dardi; Nikhil Patel
- Main IPC: H01B1/24
- IPC: H01B1/24

Abstract:
Highly uniform silicon/germanium nanoparticles can be formed into stable dispersions with a desirable small secondary particle size. The silicon/germanium particles can be surface modified to form the dispersions. The silicon/germanium nanoparticles can be doped to change the particle properties. The dispersions can be printed as an ink for appropriate applications. The dispersions can be used to form selectively doped deposits of semiconductor materials such as for the formation of photovoltaic cells or for the formation of printed electronic circuits.
Public/Granted literature
- US20080160265A1 Silicon/germanium particle inks, doped particles, printing and processes for semiconductor applications Public/Granted day:2008-07-03
Information query