Invention Grant
- Patent Title: Suspended beam for use in MEMS device
- Patent Title (中): 悬挂梁用于MEMS装置
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Application No.: US13179608Application Date: 2011-07-11
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Publication No.: US08643140B2Publication Date: 2014-02-04
- Inventor: Chin-Sheng Yang
- Applicant: Chin-Sheng Yang
- Applicant Address: TW Hsinchu
- Assignee: United Microelectronics Corp.
- Current Assignee: United Microelectronics Corp.
- Current Assignee Address: TW Hsinchu
- Agent Ding Yu Tan
- Main IPC: H01L21/02
- IPC: H01L21/02
Abstract:
A suspended beam includes a substrate, a main body and a first metal line structure. A first end of the main body is fixed onto the substrate. A second end of the main body is suspended. The first metal line structure is embedded in the main body. The width of the first metal line structure is smaller than the width of the main body.
Public/Granted literature
- US20130015556A1 SUSPENDED BEAM FOR USE IN MEMS DEVICE Public/Granted day:2013-01-17
Information query
IPC分类:
