Invention Grant
- Patent Title: Deposition mask and method of fabricating the same
- Patent Title (中): 沉积掩模及其制造方法
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Application No.: US12860096Application Date: 2010-08-20
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Publication No.: US08646405B2Publication Date: 2014-02-11
- Inventor: Chi-Wook An
- Applicant: Chi-Wook An
- Applicant Address: KR Yongin, Gyeonggi-Do
- Assignee: Samsung Display Co., Ltd.
- Current Assignee: Samsung Display Co., Ltd.
- Current Assignee Address: KR Yongin, Gyeonggi-Do
- Agency: Knobbe Martens Olson & Bear LLP
- Priority: KR10-2009-0077606 20090821
- Main IPC: B05C11/00
- IPC: B05C11/00 ; C23C16/00

Abstract:
A deposition mask capable of forming layers with different thicknesses and a method of fabricating the same are disclosed. In one embodiment, the deposition mask includes i) a plurality of regions spaced apart from each other, wherein the plurality of regions comprise at least a first region and a second region and ii) first and second surfaces opposing each other, wherein the first surface is configured to receive a deposition material. Also, a through-hole is defined in each of the plurality of regions, and wherein at least one of the through-holes in the first surface of the mask is divided into a plurality of sub-regions. Further, the number of a sub-region or sub-regions of the first region is different from that of the second region.
Public/Granted literature
- US20110041758A1 DEPOSITION MASK AND METHOD OF FABRICATING THE SAME Public/Granted day:2011-02-24
Information query