Invention Grant
- Patent Title: Apparatus and method for coating photoresist
- Patent Title (中): 光刻胶涂敷装置及方法
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Application No.: US11169218Application Date: 2005-06-28
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Publication No.: US08647703B2Publication Date: 2014-02-11
- Inventor: O Jun Kwon
- Applicant: O Jun Kwon
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Brinks Gilson & Lione
- Priority: KR10-2004-0069360 20040831
- Main IPC: B05D1/00
- IPC: B05D1/00 ; B05D1/26
Abstract:
Provided is an apparatus for coating a photoresist on a substrate. The photoresist coating apparatus includes a nozzle, a discharge unit, and a foreign substance barrier. The nozzle coats a photoresist on the substrate. The discharge unit is formed in a body with a lower portion of the nozzle and discharges a photoresist. The foreign substance barrier is formed at a front lower portion of the nozzle and protects the discharge unit from a foreign substance on the substrate.
Public/Granted literature
- US20060045972A1 Apparatus and method for coating photoresist Public/Granted day:2006-03-02
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