Invention Grant
- Patent Title: Nozzle device employing high frequency wave energy
- Patent Title (中): 采用高频波能的喷嘴装置
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Application No.: US12335675Application Date: 2008-12-16
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Publication No.: US08702017B2Publication Date: 2014-04-22
- Inventor: Lap Kei Eric Chow , Hoi Shuen Tang , Hon Keung Lai , Chi Wah Cheng
- Applicant: Lap Kei Eric Chow , Hoi Shuen Tang , Hon Keung Lai , Chi Wah Cheng
- Applicant Address: HK Hong Kong
- Assignee: ASM Assembly Automation Ltd
- Current Assignee: ASM Assembly Automation Ltd
- Current Assignee Address: HK Hong Kong
- Agency: Ostrolenk Faber LLP
- Main IPC: B05B1/08
- IPC: B05B1/08

Abstract:
A nozzle device comprising a nozzle chamber includes a fluid inlet located at a first side of the nozzle chamber which is operative to introduce fluid into the nozzle chamber in an injection direction and a fluid outlet at a second side of the nozzle chamber which is operative to expel fluid from the nozzle chamber. A high frequency wave generator is also located in the nozzle chamber which is oriented and operative to generate high frequency waves in a direction which is substantially parallel to the injection direction, whereby to impart high frequency energy to the fluid in the nozzle chamber.
Public/Granted literature
- US20100150756A1 NOZZLE DEVICE EMPLOYING HIGH FREQUENCY WAVE ENERGY Public/Granted day:2010-06-17
Information query
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