Invention Grant
- Patent Title: Gas-barrier film, gas-barrier layered body, and process for producing same
- Patent Title (中): 阻气膜,阻气性层叠体及其制造方法
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Application No.: US11568783Application Date: 2005-05-10
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Publication No.: US08703298B2Publication Date: 2014-04-22
- Inventor: Osamu Nakamura , Tomoyoshi Hakamata , Akira Nomoto
- Applicant: Osamu Nakamura , Tomoyoshi Hakamata , Akira Nomoto
- Applicant Address: JP Tokyo
- Assignee: Tohcello Co., Ltd.
- Current Assignee: Tohcello Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Westerman, Hattori, Daniels & Adrian, LLP
- Priority: JP2004-139977 20040510; JP2004-184832 20040623; JP2004-232802 20040809; JP2004-289545 20041001; JP2004-334073 20041118; JP2005-074749 20050316
- International Application: PCT/JP2005/008834 WO 20050510
- International Announcement: WO2005/108440 WO 20051117
- Main IPC: B32B27/30
- IPC: B32B27/30 ; B05D3/02

Abstract:
The gas-barrier film of the present invention basically comprises a polymer of a polyvalent metal salt of an unsaturated carboxylic acid compound which gives an infrared absorption spectrum in which the ratio of the absorbance A0 at around 1,700 cm−1 attributable to V C═O of the carboxylic acid group to the absorbance A at around 1,520 cm−1 attributable to V C═O of the carboxylate ion, A0/A, is lower than 0.25, and this gas-barrier film and a gas-barrier layered body having the film can be manufactured by applying a solution of a polyvalent metal salt of an unsaturated carboxylic acid compound having a degree of polymerization lower than 20 to at least one side of a substrate layer and then polymerizing the polyvalent metal salt of the unsaturated carboxylic acid compound.
Public/Granted literature
- US20080262179A1 Gas-Barrier Film, Gas-Barrier Layered Body, And Process For Producing Same Public/Granted day:2008-10-23
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