Invention Grant
- Patent Title: System and method to manufacture an implantable electrode
- Patent Title (中): 制造可植入电极的系统和方法
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Application No.: US14030069Application Date: 2013-09-18
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Publication No.: US08703537B2Publication Date: 2014-04-22
- Inventor: David S. Pellinen , Jamille Farraye Hetke , Daryl R. Kipke , Kc Kong , Rio J. Vetter , Mayurachat Ning Gulari
- Applicant: NeuroNexus Technologies, Inc.
- Applicant Address: US MI Ann Arbor
- Assignee: NeuroNexus Technologies, Inc.
- Current Assignee: NeuroNexus Technologies, Inc.
- Current Assignee Address: US MI Ann Arbor
- Agent Michael F. Scalise
- Main IPC: H01L23/48
- IPC: H01L23/48

Abstract:
The method of the preferred embodiments includes the steps of providing a base having a frame portion and a center portion; building a preliminary structure coupled to the base; removing a portion of the preliminary structure to define a series of devices and a plurality of bridges; removing the center portion of the base such that the frame portion defines an open region, wherein the plurality of bridges suspend the series of devices in the open region defined by the frame; and encapsulating the series of devices. The method is preferably designed for the manufacture of semiconductor devices, and more specifically for the manufacture of encapsulated implantable electrodes. The method, however, may be alternatively used in any suitable environment and for any suitable reason.
Public/Granted literature
- US20140027888A1 SYSTEM AND METHOD TO MANUFACTURE AN IMPLANTABLE ELECTRODE Public/Granted day:2014-01-30
Information query
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