Invention Grant
- Patent Title: Scanning electron microscope
- Patent Title (中): 扫描电子显微镜
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Application No.: US13812451Application Date: 2011-08-26
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Publication No.: US08704175B2Publication Date: 2014-04-22
- Inventor: Yasunari Sohda , Hiromasa Yamanashi , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro
- Applicant: Yasunari Sohda , Muneyuki Fukuda , Takeyoshi Ohashi , Osamu Komuro , Toru Yamanashi
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-220226 20100930
- International Application: PCT/JP2011/004749 WO 20110826
- International Announcement: WO2012/042738 WO 20120405
- Main IPC: H01J37/28
- IPC: H01J37/28

Abstract:
Provided is a scanning electron microscope equipped with a high-speed and high-precision astigmatism measuring means to be used when both astigmatism generated by an electron-beam column and astigmatism generated from the surroundings of a measuring sample exist. This scanning electron microscope is characterized in controlling an astigmatism corrector (201) with high-speed and high-precision, to correct the astigmatism, by using both a method of obtaining the astigmatism from the qualities of two-dimensional images to be acquired upon changing the intensity of the astigmatism corrector (201), and a method of measuring the astigmatism from the change in the position displacement of an electron beam that occurs when the electron beam is tilted using a tilt deflector (202).
Public/Granted literature
- US20130175447A1 Scanning Electron Microscope Public/Granted day:2013-07-11
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