Invention Grant
- Patent Title: Inductively coupled plasma source as an electron beam source for spectroscopic analysis
- Patent Title (中): 电感耦合等离子体源作为光谱分析的电子束源
-
Application No.: US13306032Application Date: 2011-11-29
-
Publication No.: US08716673B2Publication Date: 2014-05-06
- Inventor: Brian Roberts Routh, Jr.
- Applicant: Brian Roberts Routh, Jr.
- Applicant Address: US OR Hillsboro
- Assignee: FEI Company
- Current Assignee: FEI Company
- Current Assignee Address: US OR Hillsboro
- Agency: Scheinberg & Associates, PC
- Agent Michael O. Scheinberg; John P. Horvath
- Main IPC: H01J49/08
- IPC: H01J49/08 ; H01J49/10 ; H01J37/30
Abstract:
A single column inductively coupled plasma source with user selectable configurations operates in ion-mode for FIB operations or electron mode for SEM operations. Equipped with an x-ray detector, energy dispersive x-ray spectroscopy analysis is possible. A user can selectively configure the ICP to prepare a sample in the ion-mode or FIB mode then essentially flip a switch selecting electron-mode or SEM mode and analyze the sample using EDS or other types of analysis.
Public/Granted literature
- US20130134307A1 Inductively Coupled Plasma Source as an Electron Beam Source for Spectroscopic Analysis Public/Granted day:2013-05-30
Information query
