Invention Grant
- Patent Title: Charged particle beam apparatus
- Patent Title (中): 带电粒子束装置
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Application No.: US13789434Application Date: 2013-03-07
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Publication No.: US08729491B2Publication Date: 2014-05-20
- Inventor: Hideto Dohi , Akira Ikegami , Hideyuki Kazumi
- Applicant: Hitachi High-Technologies Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: McDermott Will & Emery LLP
- Priority: JP2012-162258 20120723
- Main IPC: H01J37/147
- IPC: H01J37/147 ; H01J3/26 ; H01J29/58

Abstract:
The present invention provides a charged particle beam apparatus which is provided with a tilting deflector which is disposed between a charged particle source and an objective lens and tilts a charged particle beam, wherein a first optical element includes an electromagnetic quadrupole which generates dispersion to suppress the dispersion which is generated by deflection by the tilting deflector, and a second optical element is composed of a deflector for deflecting the charged particle beam which enters the first optical element or an electromagnetic quadrupole which causes the charged particle beam to generate a dispersion different from the dispersion generated by the first optical element.
Public/Granted literature
- US20140021366A1 CHARGED PARTICLE BEAM APPARATUS Public/Granted day:2014-01-23
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