Invention Grant
US08741392B2 Anodically assisted chemical etching of conductive polymers and polymer composites
有权
导电聚合物和聚合物复合材料的阳极辅助化学蚀刻
- Patent Title: Anodically assisted chemical etching of conductive polymers and polymer composites
- Patent Title (中): 导电聚合物和聚合物复合材料的阳极辅助化学蚀刻
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Application No.: US12476506Application Date: 2009-06-02
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Publication No.: US08741392B2Publication Date: 2014-06-03
- Inventor: Jonathan McCrea , Konstantinos Panagiotopoulos , Herath Katugaha , Klaus Tomantschger
- Applicant: Jonathan McCrea , Konstantinos Panagiotopoulos , Herath Katugaha , Klaus Tomantschger
- Applicant Address: CA Mississauga, Ontario
- Assignee: Integran Technologies, Inc.
- Current Assignee: Integran Technologies, Inc.
- Current Assignee Address: CA Mississauga, Ontario
- Agency: Bacon & Thomas, PLLC
- Main IPC: B05D3/10
- IPC: B05D3/10 ; B05D3/12 ; B05D3/00
Abstract:
A novel activation/etch method is disclosed for conductive polymer substrates and conductive polymer composite substrates to achieve good adhesion to subsequently applied coatings. The method in a preferred case involves anodically polarizing conductive polymers/polymer composites in aqueous etching solutions.
Public/Granted literature
- US20100300889A1 ANODICALLY ASSISTED CHEMICAL ETCHING OF CONDUCTIVE POLYMERS AND POLYMER COMPOSITES Public/Granted day:2010-12-02
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