Invention Grant
- Patent Title: Laser ion source
- Patent Title (中): 激光离子源
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Application No.: US13771584Application Date: 2013-02-20
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Publication No.: US08742362B2Publication Date: 2014-06-03
- Inventor: Kazuo Hayashi , Akiko Kakutani , Akihiro Osanai , Kiyokazu Sato , Tsutomu Kurusu , Takeshi Yoshiyuki
- Applicant: Kabushiki Kaisha Toshiba
- Applicant Address: JP Minato-ku
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Minato-ku
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2010-244302 20101029
- Main IPC: H01J27/24
- IPC: H01J27/24 ; H01J27/02 ; H01J49/10

Abstract:
According to one embodiment, a laser ion source is configured to generate ions by application of a laser beam, the laser ion source including a case to be evacuated, an irradiation box disposed in the case and including a target which generates ions by irradiation of laser light, an ion beam extraction mechanism which electrostatically extracts ions from the irradiation box and guides the ions outside the case as an ion beam, a valve provided to an ion beam outlet of the case, the valve being opened at ion beam emission and being closed at other times, and a shutter provided between the valve and the irradiation box, the shutter being intermittently opened at ion beam emission and being closed at other times.
Public/Granted literature
- US20130161530A1 LASER ION SOURCE Public/Granted day:2013-06-27
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