Invention Grant
- Patent Title: Sample analyzing apparatus and sample analyzing method
- Patent Title (中): 样品分析仪器和样品分析方法
-
Application No.: US13605580Application Date: 2012-09-06
-
Publication No.: US08748844B2Publication Date: 2014-06-10
- Inventor: Haruko Akutsu
- Applicant: Haruko Akutsu
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2012-069903 20120326
- Main IPC: G01N23/00
- IPC: G01N23/00 ; H01J37/26 ; H01J37/24 ; H01J37/28 ; H01J37/244 ; G01N23/22 ; G01N23/225

Abstract:
In accordance with an embodiment, a sample analyzing apparatus includes a charged beam generating unit, a detecting unit, and an analyzing unit. The charged beam generating unit is configured to generate a charged beam and apply the charged beam to a sample. The detecting unit is configured to detect charged particles and then output a signal, the charged particles being generated from the sample by the application of the charged beam in a manner depending on a three-dimensional structure and material characteristics of the sample. The analyzing unit is configured to process the signal to analyze the sample.
Public/Granted literature
- US20130248706A1 SAMPLE ANALYZING APPARATUS AND SAMPLE ANALYZING METHOD Public/Granted day:2013-09-26
Information query