Invention Grant
- Patent Title: Method for aligning nanostructures
- Patent Title (中): 纳米结构对准方法
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Application No.: US13889326Application Date: 2013-05-07
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Publication No.: US08765231B2Publication Date: 2014-07-01
- Inventor: Luat T. Vuong , Matthew Moocarme
- Applicant: Research Foundation of the City University of New York
- Applicant Address: US NY New York
- Assignee: Research Foundation of the City University of New York
- Current Assignee: Research Foundation of the City University of New York
- Current Assignee Address: US NY New York
- Agency: Hiscock & Barclay, LLP
- Main IPC: B05D3/00
- IPC: B05D3/00 ; H01F1/00 ; B82B3/00 ; B05D3/06

Abstract:
Disclosed in this specification is a method for aligning nanostructures. A substrate is coated with a liquid solution comprising particles. Before the solution is cured, circularly-polarized light is applied to the substrate to induce a magnetic field in the particles. A low strength magnetic field is then applied. The induced magnetic field of the particles aligns with the applied magnetic field. The solution is permitted to cure while simultaneously exposed to both the circularly-polarized light and the applied magnetic field. The resulting composite retains the particle alignment.
Public/Granted literature
- US20130316090A1 METHOD FOR ALIGNING NANOSTRUCTURES Public/Granted day:2013-11-28
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