A drawing apparatus include: a charged particle optical system configured to generate M×N charged particle beams; a limiting device configured to limit number of charged particle beams that the charged particle optical system emits toward a substrate; and a controller configured, if an abnormal beam that does not satisfy a use condition is present among the M×N charged particle beams, to control the limiting device such that only m rows, each of the m rows including n charged particle beams that are successive without intervention of the abnormal beam.