Invention Grant
- Patent Title: Diffraction element, manufacturing method for diffraction element, and spectrometer using the same
- Patent Title (中): 衍射元件,衍射元件的制造方法和使用其的光谱仪
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Application No.: US12776649Application Date: 2010-05-10
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Publication No.: US08767300B2Publication Date: 2014-07-01
- Inventor: Yoshihiro Ishibe
- Applicant: Yoshihiro Ishibe
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi Kimms & McDowell LLP
- Priority: JP2009-114058 20090509
- Main IPC: G02B27/44
- IPC: G02B27/44 ; G02B5/18 ; G01J3/40 ; G01J3/447 ; B23B3/00

Abstract:
Objects are to obtain a highly accurate diffraction element that may prevent an intensity decrease of a light beam entering a light receiving unit without a decrease in diffraction efficiency and without a problem of flare or the like, a manufacturing method for the diffraction element, and a spectrometer using the same. A diffraction element (2) includes a diffraction grating formed on a substrate having a curved surface. In the diffraction element (2), the curved surface (3) has an anamorphic shape formed by pivoting a curved line (I) in a plane about a straight line (II) in the same plane serving as a rotation axis, and gratings (10a) of the diffraction grating (10) exist in cross sections orthogonal to the rotation axis.
Public/Granted literature
- US20100284084A1 DIFFRACTION ELEMENT, MANUFACTURING METHOD FOR DIFFRACTION ELEMENT, AND SPECTROMETER USING THE SAME Public/Granted day:2010-11-11
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