Invention Grant
- Patent Title: Aberration correction device and charged particle beam device employing same
- Patent Title (中): 畸变校正装置和采用其的带电粒子束装置
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Application No.: US13806057Application Date: 2011-07-26
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Publication No.: US08791423B2Publication Date: 2014-07-29
- Inventor: Yoichi Hirayama
- Applicant: Yoichi Hirayama
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2010-168310 20100727
- International Application: PCT/JP2011/066919 WO 20110726
- International Announcement: WO2012/014870 WO 20120202
- Main IPC: H01J37/153
- IPC: H01J37/153 ; H01J3/12 ; H01J37/28
Abstract:
An aberration correction device includes, between a TEM objective lens and an STEM objective lens, a transfer lens group for transferring a coma-free surface of the TEM objective lens to a multipolar lens, a transfer lens group for transferring the coma-free surface of the TEM objective lens to a multipolar lens, and a transfer lens for correcting fifth-order spherical aberration of the STEM objective lens.
Public/Granted literature
- US20130112873A1 Aberration Correction Device and Charged Particle Beam Device Employing Same Public/Granted day:2013-05-09
Information query
