Invention Grant
US08792147B2 Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout
有权
用于创建光学模型校准的最佳测试图案并从任意布局中选择合适的校准测试图案的方法，程序产品和设备
- Patent Title: Method, program product and apparatus for creating optimal test patterns for optical model calibration and for selecting suitable calibration test patterns from an arbitrary layout
- Patent Title (中): 用于创建光学模型校准的最佳测试图案并从任意布局中选择合适的校准测试图案的方法，程序产品和设备
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Application No.: US11889574Application Date: 2007-08-14
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Publication No.: US08792147B2Publication Date: 2014-07-29
- Inventor: Edita Tejnil
- Applicant: Edita Tejnil
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: H04N1/46
- IPC: H04N1/46
Abstract:
A method of determining calibration test patterns to be utilized to calibrate a model for simulating the imaging performance of an optical imaging system. The method includes the steps of defining a model equation representing the imaging performance of the optical imaging system; transforming the model equation into a plurality of discrete functions; identifying a calibration pattern for each of the plurality of discrete functions, where each calibration pattern corresponding to one of the plurality of discrete functions being operative for manipulating the one of the plurality of discrete functions during a calibration process; and storing the calibration test patterns identified as corresponding to the plurality of discrete functions. The calibration test patterns are then utilized to calibrate the model for simulating the imaging performance of an optical imaging system.
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