Invention Grant
US08795488B2 Apparatus for physical vapor deposition having centrally fed RF energy
有权
用于物理气相沉积的装置具有中央馈送的RF能量
- Patent Title: Apparatus for physical vapor deposition having centrally fed RF energy
- Patent Title (中): 用于物理气相沉积的装置具有中央馈送的RF能量
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Application No.: US13048440Application Date: 2011-03-15
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Publication No.: US08795488B2Publication Date: 2014-08-05
- Inventor: Muhammad Rasheed , Lara Hawrylchak , Michael S. Cox , Donny Young , Kirankumar Savandaiah , Alan Ritchie
- Applicant: Muhammad Rasheed , Lara Hawrylchak , Michael S. Cox , Donny Young , Kirankumar Savandaiah , Alan Ritchie
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Moser Taboada
- Agent Alan Taboada
- Main IPC: C23C14/40
- IPC: C23C14/40

Abstract:
In some embodiments, a feed structure to couple RF energy to a target may include a body having a first end to receive RF energy and a second end opposite the first end to couple the RF energy to a target, the body further having a central opening disposed through the body from the first end to the second end; a first member coupled to the body at the first end, wherein the first member comprises a first element circumscribing the body and extending radially outward from the body, and one or more terminals disposed in the first member to receive RF energy from an RF power source; and a source distribution plate coupled to the second end of the body to distribute the RF energy to the target, wherein the source distribution plate includes a hole disposed through the plate and aligned with the central opening of the body.
Public/Granted literature
- US20110240464A1 APPARATUS FOR PHYSICAL VAPOR DEPOSITION HAVING CENTRALLY FED RF ENERGY Public/Granted day:2011-10-06
Information query
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